The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2024
Filed:
Aug. 07, 2020
Screen Holdings Co., Ltd., Kyoto, JP;
Kazuhiko Fuse, Kyoto, JP;
SCREEN Holdings Co., Ltd., Kyoto, JP;
Abstract
As treatment of a semiconductor wafer to be a product proceeds in a heat treatment apparatus, contaminants adhere to an inner wall surface of a chamber. After the treatment of the semiconductor wafer is completed, a gas containing ozone is supplied into the chamber to form an atmosphere containing ozone. While the atmosphere containing ozone is heated by irradiation with light from a halogen lamp, a flash lamp emits a flash of light containing ultraviolet light. The ultraviolet light decomposes ozone to generate active oxygen, and the active oxygen reacts with the contaminants to decompose and remove the contaminants from the inner wall surface of the chamber. The contaminants decomposed and vaporized are discharged out of the chamber by exhausting the atmosphere in the chamber.