The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2024

Filed:

Jun. 21, 2023
Applicant:

Nvidia Corporation, Santa Clara, CA (US);

Inventors:

Robert A. Alfieri, Chapel Hill, NC (US);

Peter S. Shirley, Salt Lake City, UT (US);

Assignee:

NVIDIA Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/06 (2011.01); G06F 9/48 (2006.01); G06F 15/80 (2006.01); G06T 15/00 (2011.01); G06T 15/80 (2011.01); G06T 17/00 (2006.01);
U.S. Cl.
CPC ...
G06T 15/06 (2013.01); G06F 9/4881 (2013.01); G06F 15/80 (2013.01); G06T 15/005 (2013.01); G06T 15/80 (2013.01); G06T 17/005 (2013.01); G06T 2210/52 (2013.01);
Abstract

One embodiment of a computer-implemented method for processing ray tracing operations in parallel includes receiving a plurality of rays and a corresponding set of importance sampling instructions for each ray included in the plurality of rays for processing, wherein each ray represents a path from a light source to at least one point within a three-dimensional (3D) environment, and each corresponding set of importance sampling instruction is based at least in part on one or more material properties associated with at least one surface of at least one object included in the 3D environment; assigning each ray included in the plurality of rays to a different processing core included in a plurality of processing cores; and for each ray included in the plurality of rays, causing the processing core assigned to the ray to execute the corresponding set of importance sampling instructions on the ray to generate a direction for a secondary ray that is produced when the ray intersects a surface of an object within the 3D environment.


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