The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2024
Filed:
Mar. 11, 2021
Nanosystem Solutions, Inc., Okinawa, JP;
Kazuhiko Kimura, Okinawa, JP;
NANOSYSTEM SOLUTIONS, INC., Okinawa, JP;
Abstract
Provided is an exposure device capable of improving exposure accuracy while ensuring throughput. The exposure deviceincludes: a reflective liquid-crystal modulating device; a light source deviceuniformly illuminating the reflective liquid-crystal modulating devicewith power-stabilized pulsed laser light in a ultraviolet wavelength band; a projection optical systemforming an image of reflected light modulated by the reflective liquid-crystal modulating device; and a stagesupporting a target on which exposure is performed by a pattern imaged by the projection optical system
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile