The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2024

Filed:

Mar. 30, 2021
Applicant:

Samsung Sdi Co., Ltd., Yongin-si, KR;

Inventors:

Changsoo Woo, Suwon-si, KR;

Eunmi Kang, Suwon-si, KR;

Jaehyun Kim, Suwon-si, KR;

Jimin Kim, Suwon-si, KR;

Taeho Kim, Suwon-si, KR;

Ran Namgung, Suwon-si, KR;

Kyungsoo Moon, Suwon-si, KR;

Hwansung Cheon, Suwon-si, KR;

Seungyong Chae, Suwon-si, KR;

Seung Han, Suwon-si, KR;

Assignee:

Samsung SDI Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07F 7/22 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0042 (2013.01); C07F 7/2224 (2013.01); G03F 7/0045 (2013.01); H01L 21/0274 (2013.01);
Abstract

A semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1, a photoacid generator (PAG), and a solvent: In Chemical Formula 1, R is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 aliphatic unsaturated organic group including at least one double bond or triple bond, a substituted or unsubstituted C6 to C30 aryl group, an ethoxy group, a propoxy group, or a combination thereof; and X, Y, and Z are each independently —ORor —OC(═O)R.


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