The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2024
Filed:
Oct. 01, 2021
Applicant:
Shimadzu Corporation, Kyoto, JP;
Inventor:
Junichiro Kozaki, Kyoto, JP;
Assignee:
SHIMADZU CORPORATION, Kyoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16K 31/02 (2006.01); F04D 19/04 (2006.01); F04D 27/00 (2006.01); F16K 37/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
F04D 27/001 (2013.01); F04D 19/042 (2013.01); F04D 27/008 (2013.01); F16K 31/02 (2013.01); F16K 37/0083 (2013.01); H01L 21/67253 (2013.01); F05D 2210/12 (2013.01); F05D 2260/607 (2013.01); F05D 2260/80 (2013.01);
Abstract
An estimation device for estimating a process gas condition in a system for pumping gas from a vacuum chamber into which the gas is injected to perform a treatment process by a vacuum pump attached to the vacuum chamber through a vacuum valve, comprises: a computer having a processor and a memory, wherein the computer estimates a first process gas condition including an injected gas type and a gas flow rate based on correlation data between a valve body opening degree of the vacuum valve and an effective exhaust speed of the system regarding a predetermined gas type and a chamber pressure of the vacuum chamber.