The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2024

Filed:

Mar. 01, 2021
Applicant:

Toto Ltd., Kitakyushu, JP;

Inventors:

Ryojiro Hijikata, Kitakyushu, JP;

Saori Ukigai, Kitakyushu, JP;

Assignee:

Toto Ltd., Fukuoka, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
E03C 1/04 (2006.01); B32B 9/04 (2006.01); B32B 15/04 (2006.01);
U.S. Cl.
CPC ...
E03C 1/0404 (2013.01); B32B 9/041 (2013.01); B32B 15/04 (2013.01); B32B 2255/06 (2013.01); B32B 2255/20 (2013.01); B32B 2255/205 (2013.01); B32B 2255/28 (2013.01); B32B 2307/402 (2013.01);
Abstract

A part includes a base material and a surface layer on the base material, wherein a curved surface of the part has: a root mean square height (Sq) of 0.03 μm to 1 μm, a skewness (Ssk) of −1 to 5, and an autocorrelation length (Sal) of 10 μm to 65 μm; and the surface layer is water-repellent, and exhibits a sputtering time of 5 minutes or less, the sputtering time being a time taken from the start of the sputtering to an end point of the surface layer, and the end point being defined, in a profile obtained by an XPS depth direction analysis of the surface layer, as a point where a difference of an absolute value between a carbon atom concentration at a certain measurement point and a carbon atom concentration at a measurement point just prior to the certain measurement point is 1.0 at % or less.


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