The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2024

Filed:

May. 22, 2019
Applicants:

Pioneer Overseas Corporation, Johnston, IA (US);

Sinobioway Bio-agriculture Group Co. Ltd., Beijing, CN;

Inventors:

Guihua Lu, San Diego, CA (US);

Guokui Wang, Beijing, CN;

Guanfan Mao, Beijing, CN;

Changgui Wang, Beijing, CN;

Rongrong Jiao, Beijing, CN;

Yu Zhang, Beijing, CN;

Guangwu Chen, Beijing, CN;

Jiantao Wang, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12N 15/82 (2006.01); C12N 9/22 (2006.01);
U.S. Cl.
CPC ...
C12N 15/8273 (2013.01); C12N 9/22 (2013.01); C12N 15/8213 (2013.01); C12N 15/8218 (2013.01); C12N 15/8261 (2013.01);
Abstract

Provided are suppression DNA constructs and CRISPR/Cas9 DNA constructs that are useful for conferring improved drought tolerance, yield, and/or nitrogen stress tolerance in a plant. Also provided are genome edited plants, or plants expressing a suppression DNA construct, having improved drought tolerance, yield and/nitrogen stress tolerance. Further provided are methods for improving drought tolerance, yield, and/or nitrogen stress tolerance by introducing a genome edit in a plant or expressing a suppression DNA construct in a plant.


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