The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2024
Filed:
Mar. 03, 2021
Applicant:
Shoei Chemical Inc., Tokyo, JP;
Inventors:
Benjamin Newmeyer, San Jose, CA (US);
Christian Ippen, Cupertino, CA (US);
Jesse Manders, Mountain View, CA (US);
Ruiqing Ma, Morristown, NJ (US);
Dylan Charles Hamilton, Oakland, CA (US);
Assignee:
SHOEI CHEMICAL INC., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 50/115 (2023.01); C09K 11/02 (2006.01); C09K 11/88 (2006.01); H10K 85/10 (2023.01); H10K 85/60 (2023.01); B82Y 20/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
C09K 11/883 (2013.01); C09K 11/02 (2013.01); H10K 50/115 (2023.02); H10K 85/1135 (2023.02); H10K 85/633 (2023.02); B82Y 20/00 (2013.01); B82Y 40/00 (2013.01);
Abstract
This disclosure pertains to the field of nanotechnology. The disclosure provides methods of preparing nanostructures using a Group IV metal halide. The nanostructures have high quantum yield, narrow emission peak width, tunable emission wavelength, and colloidal stability. Also provided are nanostructures prepared using the methods. And, nanostructure films and molded articles comprising the nanostructures are also provided.