The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2024

Filed:

Feb. 08, 2021
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Jung Su Han, Daejeon, KR;

Won Sang Kwon, Daejeon, KR;

Jung Eun Kim, Daejeon, KR;

Seung Uk Yeu, Daejeon, KR;

Do Young Ha, Daejeon, KR;

Assignee:

LG Chem, Ltd., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 9/04 (2006.01); C08J 5/02 (2006.01);
U.S. Cl.
CPC ...
C08L 9/04 (2013.01); C08J 5/02 (2013.01); C08J 2309/04 (2013.01); C08L 2201/52 (2013.01);
Abstract

The present technology provides a carboxylic acid-modified nitrile-based copolymer latex including a carboxylic acid-modified nitrile-based copolymer including a conjugated diene-based monomer-derived unit, an ethylenic unsaturated nitrile-based monomer-derived unit, and an ethylenic unsaturated acid monomer-derived unit, wherein the carboxylic acid-modified nitrile-based copolymer latex satisfies General Formulas 1 and General Formula 2.


Find Patent Forward Citations

Han, Jung. (2024). Carboxylic acid modified-nitrile based copolymer latex (U.S. Patent No. 12157817). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12157817

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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