The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2024
Filed:
Feb. 08, 2021
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Seung Whan Oh, Daejeon, KR;
Won Sang Kwon, Daejeon, KR;
Jung Eun Kim, Daejeon, KR;
Ji Hyun Kim, Daejeon, KR;
Seung Uk Yeu, Daejeon, KR;
Myung Su Jang, Daejeon, KR;
Do Young Ha, Daejeon, KR;
Jung Su Han, Daejeon, KR;
Assignee:
LG Chem, Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 9/04 (2006.01); B29C 41/00 (2006.01); B29C 41/14 (2006.01); B29K 9/00 (2006.01); B29K 105/00 (2006.01); C08J 5/02 (2006.01);
U.S. Cl.
CPC ...
C08L 9/04 (2013.01); C08J 5/02 (2013.01); B29C 41/003 (2013.01); B29C 41/14 (2013.01); B29K 2009/00 (2013.01); B29K 2105/0085 (2013.01); C08J 2309/04 (2013.01); C08L 2201/52 (2013.01); C08L 2312/00 (2013.01);
Abstract
The present technology relates to a latex composition for dip molding comprising a carboxylic acid-modified nitrile-based copolymer latex satisfying General Formulas 1 and 2, wherein the carboxylic acid-modified nitrile-based copolymer includes a conjugated diene-based monomer-derived unit, an ethylenic unsaturated nitrile-based monomer-derived unit, and an ethylenic unsaturated acid monomer-derived unit, and a molded article.