The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2024

Filed:

May. 29, 2022
Applicant:

National Taiwan University of Science and Technology, Taipei, TW;

Inventors:

Jeng-Ywan Jeng, Taipei, TW;

Ding-Zheng Lin, Taipei, TW;

Ping-Hung Yu, Taipei, TW;

Yu-Cheng Chen, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/286 (2017.01); B29C 64/129 (2017.01); B29C 64/245 (2017.01); B29C 64/255 (2017.01); B29C 64/393 (2017.01); B33Y 30/00 (2015.01); B33Y 50/02 (2015.01);
U.S. Cl.
CPC ...
B29C 64/129 (2017.08); B29C 64/245 (2017.08); B29C 64/255 (2017.08); B29C 64/393 (2017.08); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12);
Abstract

A large area deposition type additive manufacturing equipment is disclosed. The large area deposition type additive manufacturing equipment includes a light source module, a dynamic photomask module, a raw material tank and a deposition module. The light source module includes a plurality of light emitting members, a light diffusion member, a light enhancement member and a light emitting angle limiter. Light emitted from the light emitting members passes through the light diffusion member, the light enhancement member and the light emitting angle limiter to become a collimated curing light. The collimated curing light travels through a transparent member of the raw material tank and a dynamic photomask module to reach liquid photocurable material in the raw material tank, thereby curing the liquid photocurable material. The angle of emitted light ranges within ±30° with respect to a normal line of an incident plane of the light source module.


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