The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2024

Filed:

Dec. 02, 2021
Applicants:

Illumina, Inc., San Diego, CA (US);

Illumina Cambridge Limited, Cambridge, GB;

Inventors:

Alexandre Richez, Cambridge, GB;

Andrew A. Brown, Cambridge, GB;

Julia Morrison, Grays, GB;

Wayne N. George, Ilford, GB;

Timothy J. Merkel, San Diego, CA (US);

Audrey Rose Zak, Carlsbad, CA (US);

Assignees:

Illumina, Inc., San Diego, CA (US);

Illumina Cambridge Limited, Cambridge, GB;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 33/38 (2006.01); B29C 33/40 (2006.01); B29C 59/02 (2006.01); B29L 31/00 (2006.01); B81C 1/00 (2006.01); C09D 4/00 (2006.01); C09D 133/26 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
B29C 33/3842 (2013.01); B29C 33/40 (2013.01); B29C 59/026 (2013.01); B81C 1/0046 (2013.01); C09D 133/26 (2013.01); G03F 7/0002 (2013.01); B29K 2883/00 (2013.01); B29L 2031/752 (2013.01); C09D 4/00 (2013.01);
Abstract

An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.


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