The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2024

Filed:

Aug. 28, 2018
Applicant:

Fuji Corporation, Chiryu, JP;

Inventors:

Shinji Takikawa, Anjo, JP;

Takahiro Jindo, Anjo, JP;

Assignee:

FUJI CORPORATION, Chiryu, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); H01J 37/3244 (2013.01); H01J 37/32935 (2013.01);
Abstract

In a plasma generator having a first supply port and a second supply port, in which the plasma generator includes a first supply device for supplying a first gas from the first supply port, and a second supply device connected to the first supply device so as to supply a second gas from the second supply port, a gas supply determination method includes a first supply step of causing the first supply device to start supplying the first gas in a state where the second supply device stops supplying the second gas, a first measurement step of measuring a flow rate of the gas supplied to the first supply port after the first supply step, and a first notification step of notifying a supply state of the first gas in the first supply port in accordance with a flow rate measurement result of the first measurement step.


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