The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2024

Filed:

Apr. 11, 2022
Applicant:

Siemens Medical Solutions Usa, Inc., Malvern, PA (US);

Inventor:

Miesher Rodrigues, Buffalo Grove, IL (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/40 (2006.01); B29C 64/393 (2017.01); B33Y 50/02 (2015.01); B33Y 80/00 (2015.01); G02B 27/30 (2006.01); G05B 19/4099 (2006.01); A61B 6/06 (2006.01); B29L 11/00 (2006.01); B33Y 10/00 (2015.01); G21K 1/02 (2006.01);
U.S. Cl.
CPC ...
G05B 19/4099 (2013.01); B29C 64/393 (2017.08); B33Y 50/02 (2014.12); B33Y 80/00 (2014.12); G02B 27/30 (2013.01); B29L 2011/00 (2013.01); B33Y 10/00 (2014.12); G05B 2219/35134 (2013.01); G05B 2219/49023 (2013.01);
Abstract

Systems and methods to manufacture a collimator include deposition of a first layer of material in a first pattern, the first pattern comprising a first plurality of substantially parallel lines oriented in a first direction, and deposition of a second layer of material in a second pattern directly upon the first layer of material, the second pattern comprising a second plurality of substantially parallel lines oriented in a second direction different from the first direction. An area bounded by a first pair of the first plurality of substantially parallel lines and a second pair of the second plurality of substantially parallel lines intersecting the first pair defines a septum of the collimator.


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