The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2024

Filed:

Feb. 11, 2022
Applicant:

Pratt & Whitney Canada Corp., Longueuil, CA;

Inventors:

Visal Ing, Sainte-Julie, CA;

Rachid Guiassa, Longueuil, CA;

Joel Jean, Shannon, CA;

Ghislain Hardy, Sainte-Julie, CA;

Faical Ghezala, Saint-Hubert, CA;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05B 19/401 (2006.01); B23Q 23/00 (2006.01);
U.S. Cl.
CPC ...
G05B 19/401 (2013.01); B23Q 23/00 (2013.01);
Abstract

A method for calibrating a machining system includes providing the machining system which includes a base, a cantilevered arm, and a rotary table positioned at the second arm end of the cantilevered arm. The rotary table is rotatable relative to the cantilevered arm about a first axis. The first axis has a first unloaded position and a first unloaded orientation with the machining system in an unloaded condition. The method further includes installing a measurement artifact on the rotary table, measuring a first position of the measurement artifact, and installing a load on the rotary table. The first axis has a first loaded position and a first loaded orientation with the machining system in a loaded condition. The method further includes measuring a second position of the measurement artifact and determining a positional deviation of the second position from the first position.


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