The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2024
Filed:
Dec. 15, 2022
Canon Kabushiki Kaisha, Tokyo, JP;
Tatsuya Hayashi, Tochigi, JP;
Takafumi Miyaharu, Tochigi, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint method of curing an imprint material in a state in which the imprint material on a substrate and a mold are in contact with each other, includes curing the imprint material by applying first light to the imprint material using a first light source and applying second light to the imprint material using a second light source, thereby forming a plurality of patterns made of a cured product of the imprint material. An intensity distribution of the second light applied to the imprint material by the second light source in the curing is adjusted such that a distribution of evaluation values of the plurality of patterns formed through the curing satisfies a target distribution.