The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2024

Filed:

Mar. 19, 2021
Applicant:

General Atomics Aeronautical Systems, Inc., San Diego, CA (US);

Inventors:

Patrick R. Mickel, San Diego, CA (US);

Drew F. DeJarnette, San Diego, CA (US);

Matthew C. Cristina, Oceanside, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01S 17/00 (2020.01); G01S 7/48 (2006.01); G01S 7/484 (2006.01); G01S 7/486 (2020.01); G01S 17/42 (2006.01); G01S 17/89 (2020.01);
U.S. Cl.
CPC ...
G01S 17/42 (2013.01); G01S 7/4804 (2013.01); G01S 7/484 (2013.01); G01S 7/486 (2013.01); G01S 17/89 (2013.01);
Abstract

In some embodiments, systems are provided to determine distances to one or more objects, and comprise an image capture system; an angular movement system; an illumination source providing illumination having a time varying amplitude; and a range measurement circuit configured to: obtain, based on at least one of measured and induced LOS angular displacement changes relative to the image capture system, a set of candidate point-spread-functions (PSFs) corresponding to different possible ranges; deconvolve, using the candidate PSFs, at least a region of interest (ROI) in an evaluation image to obtain at least a set of deconvolved ROIs of the evaluation image, each corresponding to one of the candidate PSFs; identify a first candidate PSF that produces a deconvolved ROI resulting in a determined artifact power that is lower than a corresponding artifact power determined from the other candidate PSFs; and determine a distance corresponding to the first candidate PSF.


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