The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2024

Filed:

Feb. 15, 2022
Applicants:

Kazuhiro Fujita, Tokyo, JP;

Rie Hirayama, Kanagawa, JP;

Inventors:

Kazuhiro Fujita, Tokyo, JP;

Rie Hirayama, Kanagawa, JP;

Assignee:

RICOH COMPANY, LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/25 (2006.01);
U.S. Cl.
CPC ...
G01B 11/254 (2013.01); G01B 11/2518 (2013.01);
Abstract

A laser irradiation apparatus includes: multiple irradiation units each to emit a laser beam to a surface of a base to form a pattern, the multiple irradiation units, including: a first irradiation unit to emit a first laser beam; and a second irradiation unit to emit a second laser beam; and a circuitry to: control the first irradiation unit to irradiate only a first irradiation region on a surface of a base with the first laser beam; and control the second irradiation unit to irradiate only a second irradiation region on the surface of the base with the second laser beam. The first irradiation region and the second irradiation region are not overlapping each other.


Find Patent Forward Citations

Loading…