The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2024

Filed:

Feb. 07, 2023
Applicant:

The Aerospace Corporation, El Segundo, CA (US);

Inventors:

Philip A. Dafesh, Manhattan Beach, CA (US);

Phillip Brian Hess, Venice, CA (US);

Gourav K. Khadge, Los Angeles, CA (US);

Assignee:

THE AEROSPACE CORPORATION, El Segundo, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04B 1/00 (2006.01); H04B 1/10 (2006.01); H04B 1/7107 (2011.01); H04B 1/719 (2011.01);
U.S. Cl.
CPC ...
H04B 1/7107 (2013.01); H04B 1/1027 (2013.01); H04B 1/1036 (2013.01); H04B 1/719 (2013.01);
Abstract

Provided herein are circuits and methods for processing samples of a received in-phase and quadrature (I/Q) domain signal that includes a desired signal and an interference signal that spectrally overlaps the desired signal. In the I/Q domain, a first contribution to the interference signal is removed from the samples using a first algorithm to generate first processed signal samples. Amplitudes and phases of the first processed signal samples are obtained. In an amplitude domain, a second contribution to the interference signal is removed from the amplitudes of the first processed signal samples using a second algorithm to generate second processed signal samples. A signal quality metric of the second processed signal samples is obtained. Based on the signal quality metric of the second processed signal samples, one or more parameters of the first or second algorithm are adjusted to improve the signal quality metric of the second processed signal samples.


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