The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2024

Filed:

Apr. 15, 2022
Applicant:

Coherent Lasersystems Gmbh & Co. KG, Göttingen, DE;

Inventor:

Paul Van Der Wilt, Goettingen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 13/30 (2006.01); B23K 26/06 (2014.01); B23K 26/0622 (2014.01); B23K 26/53 (2014.01); G02B 27/09 (2006.01); H01L 21/02 (2006.01); B23K 103/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02678 (2013.01); B23K 26/0608 (2013.01); B23K 26/0622 (2015.10); B23K 26/53 (2015.10); G02B 27/0955 (2013.01); H01L 21/02686 (2013.01); H01L 21/02691 (2013.01); B23K 2103/56 (2018.08);
Abstract

A layer on a substrate is laser annealed by pulses in a plurality of laser beams formed into a uniform line beam. The laser beams are partitioned into a first set of beams and a second set of beams. The second set of beams is incident onto the layer from a smaller range of angles than all of the beams combined. Pulses in the beams are synchronized such that pulses in the first set of beams are incident on the layer before pulses in the second set of beams. Pulses in the first set of beams melt the layer and pulses in the second set of beams sustain melting.


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Van Der Wilt, Paul. (2024). Method and apparatus for laser annealing (U.S. Patent No. 12148615). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12148615

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