The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2024
Filed:
Mar. 08, 2019
Sony Corporation, Tokyo, JP;
Yoshio Soma, Kanagawa, JP;
Tomoyuki Ootsuki, Kanagawa, JP;
Junichiro Enoki, Kanagawa, JP;
Tatsumi Sakaguchi, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
The present technology relates to a control device and method that can focus on a desired position of a subject, and a surgical microscope system. The control device includes: an initial in-focus position detection unit configured to detect a focus position when focusing on a predetermined subject included in an observation image of an eye of a patient that is a surgical operation target as an initial in-focus position; and a calculation unit configured to determine an offset value indicating a distance between a target eye organ that is inside a corneal endothelium of the eye and the initial in-focus position on the basis of information regarding structure of an eyeball, and to calculate an in-focus position that is a focus position focused on the target eye organ on the basis of the offset value and the initial in-focus position. The present technology is applicable to the surgical microscope system.