The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 2024

Filed:

Dec. 18, 2019
Applicant:

Hps Home Power Solutions Gmbh, Berlin, DE;

Inventors:

Andreas Hierl, Berlin, DE;

Renaldo Schönfeldt, Berlin, DE;

Gunnar Schneider, Wildau, DE;

Jonas Schulte, Berlin, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 8/04223 (2016.01); C25B 15/08 (2006.01);
U.S. Cl.
CPC ...
H01M 8/04231 (2013.01); C25B 15/08 (2013.01);
Abstract

The invention relates, inter alia, to a purging system, which is provided for purging at least one energy source device and/or at least one energy sink device of an energy system, comprising a purging device, which is provided in such a way that the purging device is able to produce a discharge volumetric flow () containing hydrogen during a purging process. The aim of the invention is to further advantageously modify a purging system of the type in question in order to avoid explosion hazards due to hydrogen in the discharge volumetric flow after a purging process, by means of economical measures of simple design. This aim is achieved, according to the invention, in that the purging system has a mixing device () downstream of the purging device in the flow direction of the discharge volumetric flow (), which mixing device is provided for mixing the discharge volumetric flow () with an air volumetric flow (), in particular an exhaust air volumetric flow, and that the mixing device () has a wall (), which delimits a defined open thorough-mixing space () for the mixing of the discharge volumetric flow () with the air volumetric flow (), the wall () delimiting only a subregion of the thorough-mixing space (), and the region of the mixing device () not delimited by the wall () forming an entry region () for the two volumetric flows.


Find Patent Forward Citations

Loading…