The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Dec. 26, 2019
Jusung Engineering Co., Ltd., Gwangju-si, KR;
DongHyuk Oh, Gwangju-si, KR;
Su-Young Kwon, Gwangju-si, KR;
JongSik Kim, Gwangju-si, KR;
Chul Joo Hwang, Gwangju-si, KR;
JUSUNG ENGINEERING CO., LTD., , KR;
Abstract
The present disclosure relates to a substrate processing apparatus including: a chamber; a supporting part coupled to the chamber to support the substrate; a lid disposed on the supporting part and coupled to the chamber; a purge gas injection unit coupled to the lid to inject a purge gas to a processing space between the lid and the supporting part, for dividing the processing space into a plurality of processing regions; a shield disposed between the lid and the supporting part and coupled to the lid; a first injection unit injecting a first gas to a first processing region of the processing regions; a second injection unit injecting the first gas to the first processing region at a position apart from the first injection unit; and a first partition wall part coupled to the shield so that a first injection region disposed under the first injection unit, a second injection region disposed under the second injection unit, and a first separation space between the first injection region and the second injection region are included in a region where a processing process using the first gas is performed.