The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 2024

Filed:

Nov. 15, 2022
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Young Jun Son, Chungcheongnam-do, KR;

Tae Hoon Lee, Chungcheongnam-do, KR;

Sung Gyu Lee, Chungcheongnam-do, KR;

Hyun Yoon, Chungcheongnam-do, KR;

Do Yeon Kim, Chungcheongnam-do, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B01D 35/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); B01D 35/02 (2013.01);
Abstract

A substrate processing apparatus includes: a nozzle unit configured to discharge a processing liquid to a substrate; a pipe connected to the nozzle unit and a processing liquid supply unit supplying the processing liquid; a charge amount control unit disposed at the pipe, including a filter unit charged with positive charges or negative charges, and including at least one of a control valve, controlling a flow rate of the processing liquid passing through an inside of the filter unit, and a power supply unit, applying a voltage to the filter unit, to control a charge amount of the processing liquid; and a control unit connected to the charge amount control unit.


Find Patent Forward Citations

Loading…