The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Aug. 12, 2021
Sunnybrook Research Institute, Toronto, CA;
Jeffrey Allan Fialkov, Toronto, CA;
Cari Marisa Whyne, Toronto, CA;
Jacob Zachary Fishman, North York, CA;
SUNNYBROOK RESEARCH INSTITUTE, Toronto, CA;
Abstract
Systems and methods are provided for assessing nasal deviation and symmetry via the processing of facial surface data. Facial surface data may be processed to determine a nasal deviation measure indicative of a lateral deviation between a nasal midline and a facial midplane. The facial surface data may also be processed to determine a measure of nasal symmetry associated with a selected nasal surface region, such as an aesthetic subunit. Nasal deviation and symmetry information based on both measures may then be presented. In some example implementations, a single nasal symmetry measure is generated and present for a given nasal surface region. Reference surface data characterizing a reference symmetrical facial shape and having a defined facial direction relative to a coordinate system may be employed to align the facial surface data prior to the determination of the nasal deviation and nasal symmetry measures.