The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Oct. 20, 2020
Boe Technology Group Co., Ltd., Beijing, CN;
Xiao Zhang, Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
Abstract
A method for manufacturing a nano pattern, includes: forming a pattern transfer layer on a base substrate having N imprint regions, and performing patterning processes on the pattern transfer layer to form an imprint pattern layer. A portion of the imprint pattern layer located in each imprint region is an imprint pattern, N imprint patterns are formed sequentially. Forming an i-th imprint pattern in an i-th imprint region includes: performing a patterning process on a portion of the pattern transfer layer located in the i-th imprint region to form the i-th imprint pattern; forming an i-th protective film on a side of the pattern transfer layer away from the base substrate; and removing at least a portion of the i-th protective film located in an (i+1)-th imprint region to obtain an i-th protective layer and expose a portion of the pattern transfer layer located in the (i+1)-th imprint region.