Process stop loss reduction system through rapid replacement of apparatus for trapping of reaction by-product for semiconductor process

Abstract

Disclosed is a process stop loss reduction system, in which in case that pressure in a trapping apparatus and pressure in a process chamber are increased because of space clogging or the like caused by reaction by-products while the trapping apparatus for trapping of a reaction by-product contained in exhaust gas discharged from the process chamber operates over a long period of time during a semiconductor process, only the trapping apparatus, in which an exhaust gas supply flow path is blocked, may be quickly replaced while inert gas, instead of the exhaust gas, is received in an idle state and continuously supplied to the vacuum pump through a bypass pipe without stopping an operation of (shutting down) a semiconductor manufacturing process chamber facility, and then the trapping apparatus may be supplied with the exhaust gas again as the flow path is changed.