The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Mar. 27, 2020
Osaka University, Suita, JP;
Tsuyoshi Inoue, Osaka, JP;
Haruyasu Asahara, Osaka, JP;
Kei Ohkubo, Osaka, JP;
Kenji Iwasaki, Osaka, JP;
Naoyuki Miyazaki, Osaka, JP;
Mika Hirose, Osaka, JP;
Atsushi Nakagawa, Osaka, JP;
Junichi Takagi, Osaka, JP;
Takefumi Doi, Osaka, JP;
Hiroaki Adachi, Osaka, JP;
Osaka University, Osaka, JP;
Abstract
The present invention provides a method for producing a substance with a modified carbon allotrope surface that can suppress or prevent uneven distribution, uneven orientation, and the like of a structural analysis target substance in a structural analysis by cryo-electron microscopy. A method for producing a substance with a modified carbon allotrope surface of the present invention includes: the step of surface-treating by reacting a carbon allotrope surface with a halogen oxide radical, wherein the carbon allotrope surface is modified by the surface-treating.