The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 2024

Filed:

Aug. 12, 2022
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Seiko Minami, Saitama, JP;

Hidenori Yamato, Tokyo, JP;

Takaaki Yamaguchi, Kanagawa, JP;

Nobuyuki Hirayama, Kanagawa, JP;

Kyohei Kubota, Oita, JP;

Yu Nishimura, Oita, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); B41J 2/16 (2006.01);
U.S. Cl.
CPC ...
B41J 2/1631 (2013.01); B41J 2/1601 (2013.01);
Abstract

Provided is a method for manufacturing a liquid ejection head substrate and a method for manufacturing a liquid ejection head capable of reducing degradation of the quality of a printed image. To this end, in formation of a liquid ejection head substrate, a part required to have more precise relative positional relation or not required to have high fabrication precision is set as a first part, and for the first part, a single-shot exposure method is employed. Also, a part required to have higher fabrication precision is set as a second part, and for the second part, a split exposure method is employed.


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