The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 2024

Filed:

Sep. 27, 2022
Applicant:

Honeywell International Inc., Charlotte, NC (US);

Inventors:

John Downs, Morristown, NJ (US);

Mahdi Mohajeri, Morristown, NJ (US);

Dean Eivind Johnson, Orono, MN (US);

Assignee:

Honeywell International Inc., Charlotte, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01C 19/00 (2013.01); B01J 20/02 (2006.01); B01J 20/04 (2006.01); G01C 19/64 (2006.01); G01C 19/66 (2006.01);
U.S. Cl.
CPC ...
B01J 20/0225 (2013.01); B01J 20/04 (2013.01); G01C 19/00 (2013.01); G01C 19/64 (2013.01); G01C 19/66 (2013.01); G01C 19/661 (2013.01); G01C 19/665 (2013.01);
Abstract

Systems and methods for oxide-based doping of an evaporable getter are described herein. In certain embodiments, a method includes mixing a first getter material with a second getter material to create a mixed getter material. The method also includes mixing an oxide dopant with the mixed getter material to create a doped getter material. Further, the method includes sealing the doped getter material within a device. Moreover, the method includes applying heat to the doped getter material to cause the doped getter material to emit a doped gas for deposition on internal surfaces of the device.


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