The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Apr. 18, 2023
The Procter & Gamble Company, Cincinnati, OH (US);
Timothy Ian Mullane, Union, KY (US);
Kelyn Anne Arora, Cincinnati, OH (US);
Jill Marlene Orr, Liberty Township, OH (US);
Donald Carroll Roe, West Chester, OH (US);
Jennifer Schutte, Cincinnati, OH (US);
John Brian Strube, Okeana, OH (US);
Ann Cecilia Tapp, West Chester, OH (US);
Rachael Eden Walther, Union, KY (US);
Amanda Margaret Bicking, Cincinnati, OH (US);
Jennifer Lynn Dusold, Cincinnati, OH (US);
Margaret Elizabeth Porter, Boston, MA (US);
The Procter & Gamble Company, Cincinnati, OH (US);
Abstract
A patterned apertured web is disclosed. The patterned apertured web includes a plurality of land areas in the patterned apertured web and a plurality of apertures defined in the patterned apertured web. At least some land areas of the plurality of land areas surround at least some apertures of the plurality of apertures. The patterned apertured web has an Effective Open Area in the range of about 3% to about 30%, according to the Aperture Test herein. The patterned apertured web has a plurality of Interaperture Distances, according to the Aperture Test herein. The Interaperture Distances have a distribution having a median and a mean. The plurality of apertures include a first set of apertures defining a first shape and a second set of apertures defining a second shape.