The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2024

Filed:

Apr. 30, 2020
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Eller Y. Juco, San Jose, CA (US);

Karl Frederick Leeser, West Linn, OR (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04B 1/04 (2006.01); G01R 27/06 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H04B 1/0483 (2013.01); G01R 27/06 (2013.01); H01J 37/32183 (2013.01); H01J 37/32935 (2013.01); H01J 2237/3321 (2013.01);
Abstract

An apparatus and method for performing closed-loop multiple-output control of radio frequency (RF) matching for a semiconductor wafer fabrication process is provided. An apparatus for providing signals to a station of a process chamber performs semiconductor fabrication processes. A plurality of signal generators generates signals having first and second frequencies. A measurement circuit measures a voltage standing wave ratio (VSWR). A match reflection optimizer has a reactive component configured to be adjusted responsive to an output signal from the measurement circuit.


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