The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12136564 B1

Date of Patent:

Nov. 05, 2024

Filed:

Mar. 30, 2020

Superstrate and method of making it

Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Fen Wan, Austin, TX (US);

Weijun Liu, Cedar Park, TX (US);

Assignee:

CANON KABUSHIKI KAISHA, Tokyo, JP;

Attorney:

Abel Schillinger, LLP

Primary Examiner:

Phat X Cao

Int. Cl.

CPC ...

H01L 21/687 (2006.01); H01L 21/02 (2006.01); H01L 21/768 (2006.01);

U.S. Cl.

CPC ...

H01L 21/68757 (2013.01); H01L 21/02282 (2013.01); H01L 21/76804 (2013.01);

Abstract

A superstrate can comprise a superstrate blank and a coating overlying an outer surface of the superstrate blank. The superstrate blank can comprises a central region and a tapered edge region, wherein the tapered edge region has an average taper angle of not greater than 20 degrees relative to a length direction of the superstrate blank. In one embodiment, the coating of the superstrate can be applied by spin coating and may have an edge bead below a plane of the coating surface within the central region.

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Wan, Fen. (2024). Superstrate and method of making it (U.S. Patent No. 12136564). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12136564

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