The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2024

Filed:

Jan. 04, 2022
Applicant:

Translational Imaging Innovations, Inc., Hickory, NC (US);

Inventor:

Eric L. Buckland, Hickory, NC (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 3/00 (2006.01); A61B 3/12 (2006.01); G06T 3/40 (2024.01); G06T 7/00 (2017.01); G06T 7/60 (2017.01); G06T 7/80 (2017.01); G09B 23/28 (2006.01);
U.S. Cl.
CPC ...
G06T 7/80 (2017.01); A61B 3/0025 (2013.01); A61B 3/12 (2013.01); G06T 3/40 (2013.01); G06T 7/0012 (2013.01); G06T 7/60 (2013.01); G09B 23/286 (2013.01); G06T 2207/30041 (2013.01); G06T 2207/30204 (2013.01);
Abstract

A model eye for calibrating a retinal imaging system is provided including a backplane having a negative radius of curvature R centered on the optical axis and a clear aperture diameter D; a distance h along the optical axis from the nodal point to the backplane; an unobstructed field of view 2θ; a closed fluid fillable housing; a mechanical system for mounting, aligning, and preserving spacings of the elements of the model eye; and a pattern applied to the backplane, the pattern having a rotational symmetry and a radial repeating unit, extending substantially across the clear aperture, that spatially modulates intensity of light reflected from, or transmitted through, a surface of the backplane. D/Dis greater than 2, an absolute value of R/h is greater than 0.5, and 2θ is greater than zero (0) degrees.


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