The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2024

Filed:

Sep. 03, 2019
Applicant:

Sulzer Management Ag, Winterthur, CH;

Inventor:

Matthew Bourne, Katy, TX (US);

Assignee:

Sulzer Management AG, Winterthur, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F04D 3/00 (2006.01); F04D 1/06 (2006.01); F04D 9/00 (2006.01); F04D 13/08 (2006.01); F04D 15/00 (2006.01); F04D 29/18 (2006.01); F04D 29/40 (2006.01); F04D 29/52 (2006.01); F04D 31/00 (2006.01);
U.S. Cl.
CPC ...
F04D 3/005 (2013.01); F04D 9/005 (2013.01); F04D 13/086 (2013.01); F04D 29/181 (2013.01); F04D 29/40 (2013.01); F04D 29/522 (2013.01); F04D 31/00 (2013.01); F04D 1/06 (2013.01); F04D 15/0005 (2013.01);
Abstract

A multiphase pump includes a housing having a pump inlet and a pump outlet for a process fluid, an inlet annulus configured to receive the process fluid from the pump inlet, a discharge annulus configured to discharge the process fluid into the pump outlet, a pump rotor configured to rotate about an axial direction and arranged within the housing, the pump rotor being configured to convey the process fluid from the inlet annulus to the outlet annulus, and a return line configured to return the process fluid from the high pressure side to the low pressure side, the return line including an inlet configured to receive the process fluid, an outlet configured to discharge the process fluid and a control valve configured to open and close the return line, the inlet of the return line arranged directly at the discharge annulus.


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