The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2024

Filed:

Mar. 28, 2024
Applicant:

Ebb Carbon, Inc., San Carlos, CA (US);

Inventors:

Guenther Glatz, Menlo Park, CA (US);

Jeremy Loretz, Burlingame, CA (US);

Matthew Eisaman, Port Jefferson, NY (US);

Todd Pelman, Moss Beach, CA (US);

Assignee:

Ebb Carbon, Inc., San Carlos, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/46 (2023.01); B01F 25/50 (2022.01); B01F 35/21 (2022.01); C02F 1/469 (2023.01); C02F 1/52 (2023.01); C02F 1/66 (2023.01); C02F 103/08 (2006.01);
U.S. Cl.
CPC ...
C02F 1/66 (2013.01); B01F 25/50 (2022.01); B01F 35/2132 (2022.01); C02F 1/4693 (2013.01); C02F 1/52 (2013.01); C02F 2103/08 (2013.01); C02F 2201/4618 (2013.01); C02F 2209/06 (2013.01); C02F 2209/40 (2013.01);
Abstract

Acid byproduct from an OAE system is mixed with an aqueous alkaline fluid under conditions that maintain the mixture at or above a target pH level at which the rate of acid neutralization is maximized and the release of COinto the atmosphere is prevented. A neutralization controller utilizes sensor data to monitor the mixture's pH level and to control the rate at which acid byproduct is added (e.g., by a dosing pump) to the mixture. A reaction tank and an optional circulation line and in-line mixer are utilized to perform the mixing process. An optional agitator mechanism is provided to stir the mixture in the reaction tank, and to optionally move sensors and/or injectors along circular paths through the mixture. Optional fixed sensors and/or injectors are located in designated spaced-apart regions inside the reaction tank. The mixture is treated using optional flocculation and grit processing systems/devices.


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