The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2024
Filed:
Mar. 23, 2020
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, KR;
Inventors:
Yoojeong Choi, Suwon-si, KR;
Soonhyung Kwon, Suwon-si, KR;
Minsoo Kim, Suwon-si, KR;
Hyeon Park, Suwon-si, KR;
Shinhyo Bae, Suwon-si, KR;
Jaeyeol Baek, Suwon-si, KR;
Assignee:
Samsung SDI Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/004 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); G03F 7/0045 (2013.01); G03F 7/091 (2013.01); G03F 7/092 (2013.01); G03F 7/094 (2013.01); G03F 7/162 (2013.01);
Abstract
A resist underlayer composition and a method of forming patterns using the same is disclosed. The resist underlayer composition includes a polymer including a structure represented by Chemical Formula 1 at the terminal end and a structural unit represented by Chemical Formula 2 and a structural unit represented by Chemical Formula 3 in the main chain; and a solvent. Definitions of Chemical Formula 1 to Chemical Formula 3 are the same as described in the detailed description.