The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2024
Filed:
Oct. 21, 2021
Jiangsu University, Jiangsu, CN;
Qinghua Cao, Jiangsu, CN;
Shu Yan, Jiangsu, CN;
Guoqiang Xue, Jiangsu, CN;
Weiying Chen, Jiangsu, CN;
Xin Wu, Jiangsu, CN;
Weizhong Qiu, Jiangsu, CN;
Jiangsu University, Jiangsu, CN;
Abstract
The present disclosure provides an apparent resistivity-depth section generating method for short-offset electromagnetic exploration, including: determining, in field zones divided quantitatively based on the induction number, positions of a recording point for each of observation points and frequencies or a time window thereof, and taking determined positions of the recording point as the assignment point for the observation point and the frequencies or the time window thereof, where one survey line of an axial configuration generates one apparent resistivity-depth section along the survey line; and one survey line of an equatorial configuration typically generates one apparent resistivity-depth section along the survey line, and apparent resistivity-depth sections along connecting lines from the observation points to the source which are the same as observation points in the number.