Thermal reactor for generating reactive species for chemical vapor deposition of thin films

Abstract

A remote chemical vapor deposition ('CVD') reactor and process is disclosed, which includes a vacuum insulated inner core with an inlet that is connected to vapor inlet source and an outlet connected to a deposition chamber or a secondary reactor unit. The inner core may be heated to high temperatures by any of different energy sources, allowing for breaking of chemical bonds in the flowing vapor molecules and resulting in generating vapor phase reactive intermediates that are ultimately transported to a vacuum chamber for depositing thin films by the CVD process.