The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2024
Filed:
Apr. 27, 2020
Applicant:
Dow Global Technologies Llc, Midland, MI (US);
Inventors:
Roger L. Kuhlman, Freeport, TX (US);
Pamela D. Nagel, Freeport, TX (US);
Assignee:
Dow Global Technologies LLC, Midland, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 4/76 (2006.01); C07F 17/00 (2006.01); C08F 4/6592 (2006.01);
U.S. Cl.
CPC ...
C08F 4/65925 (2013.01); C07F 17/00 (2013.01); C08F 4/76 (2013.01);
Abstract
Embodiments of the present disclosure are directed towards method of making a metal-ligand complex, the method including: reacting a (L)H compound and a base in a primary solvent to make a reaction mixture comprising an intermediate anionic Lcompound in the primary solvent; and reacting the intermediate anionic Lcompound and a LMXcomplex to make a LLMXcomplex, wherein Land Lindependently are cyclopentadienyl-type (Cp-type) ligands, M is zirconium or hafnium, and each X is a halide and wherein the intermediate anionic Lcompound is not isolated from the reaction mixture.