The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2024
Filed:
Dec. 18, 2018
Applicant:
Wacker Chemie Ag, Munich, DE;
Inventor:
Karl-Heinz Rimboeck, Heldenstein, DE;
Assignee:
Wacker Chemie AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/107 (2006.01); B01J 8/18 (2006.01);
U.S. Cl.
CPC ...
C01B 33/10742 (2013.01); B01J 8/1809 (2013.01); B01J 2208/00017 (2013.01); B01J 2208/00539 (2013.01); B01J 2208/00548 (2013.01); B01J 2208/00575 (2013.01); B01J 2208/00584 (2013.01); B01J 2208/00672 (2013.01); B01J 2208/00796 (2013.01);
Abstract
The present disclosure relates to a process for producing chlorosilanes in a fluidized bed reactor by reaction of a hydrogen and silicon tetrachloride-containing reaction gas with a particulate contact mass containing silicon and a catalyst. The chlorosilanes have the general formula HSiCland/or HClSi. The reactor design is described by an index K1, the constitution of the contact mass is described by an index K2 and the reaction conditions are described by an index K3.