The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2024

Filed:

Oct. 10, 2023
Applicant:

Lintec of America, Inc., Plano, TX (US);

Inventor:

Marcio D. Lima, Richardson, TX (US);

Assignee:

LINTEC OF AMERICA, INC., Plano, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 32/158 (2017.01); B32B 5/12 (2006.01); B32B 7/022 (2019.01); C01B 32/159 (2017.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
C01B 32/158 (2017.08); B32B 5/12 (2013.01); B32B 7/022 (2019.01); C01B 32/159 (2017.08); B32B 2250/20 (2013.01); B32B 2262/106 (2013.01); B32B 2307/732 (2013.01); B82Y 30/00 (2013.01); C01B 2202/02 (2013.01); C01B 2202/04 (2013.01); C01B 2202/06 (2013.01); C01B 2202/08 (2013.01); C01B 2202/34 (2013.01); C01B 2202/36 (2013.01); C01P 2004/03 (2013.01);
Abstract

Nanofiber membranes are described that include multiple layers of nanofiber structures, where each structure is a composite composition of multiwall carbon nanotubes and one or both of single wall and/or few walled carbon nanotubes. By selecting the relative proportions of multiwall and one or more of single/few wall carbon nanotubes in a nanofiber film, the membrane can be fabricated to withstand the heating that occurs during operation in an EUV lithography machine, while also having enough mechanical integrity to withstand pressure changes of between 1 atmosphere (atm) and 2 atm between operating cycles of an EUV lithography machine.


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