The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2024
Filed:
Aug. 29, 2019
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Byung Hyun Park, Daejeon, KR;
Byoung Hyoun Kim, Daejeon, KR;
Su Youn Han, Daejeon, KR;
Sikwon Moon, Daejeon, KR;
Assignee:
LG Chem, Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01L 3/00 (2006.01);
U.S. Cl.
CPC ...
B01L 3/5023 (2013.01); B01L 2200/141 (2013.01); B01L 2300/0803 (2013.01); B01L 2300/126 (2013.01); B01L 2300/165 (2013.01);
Abstract
The present invention relates to a high-speed screening and analysis system for reaction optimization. More specifically, the present invention provides a system capable of analyzing samples at low cost through control of fluids using hydrophilic plate-like material (for example, paper), and of analyzing chemical reactions of a sample with a plurality of materials simultaneously, thereby allowing samples to be analyzed rapidly.