The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2024

Filed:

Sep. 28, 2022
Applicant:

Dongwoo Fine-chem Co., Ltd., Jeollabuk-do, KR;

Inventors:

Seung Hyun Shin, Seoul, KR;

Yun Seok Oh, Gyeonggi-do, KR;

Won Hee Lee, Incheon, KR;

Assignee:

DONGWOO FINE-CHEM CO., LTD., Jeollabuk-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 1/22 (2006.01); H01Q 1/24 (2006.01); H01Q 1/38 (2006.01); H01Q 1/48 (2006.01); G06F 3/041 (2006.01);
U.S. Cl.
CPC ...
H01Q 1/2283 (2013.01); H01Q 1/2266 (2013.01); H01Q 1/243 (2013.01); H01Q 1/38 (2013.01); H01Q 1/48 (2013.01); G06F 3/041 (2013.01);
Abstract

An antenna stack structure according to an embodiment includes a lower dielectric layer, an antenna electrode layer formed on the lower dielectric layer, and an upper dielectric layer disposed on the antenna electrode layer. A dielectric constant of the upper dielectric layer is 1 or more and less than 7, and a thickness of the upper dielectric layer is in a range from 100 μm to 1,300 μm. A frequency and a band width are finely controlled using the upper dielectric layer while suppressing excessive gain reduction and frequency shift.


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