The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2024

Filed:

Jul. 12, 2021
Applicant:

Sensor Electronic Technology, Inc., Columbia, SC (US);

Inventors:

Maxim S. Shatalov, Mt. Sinai, NY (US);

Alexander Dobrinsky, Vienna, VA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/06 (2010.01); H01L 33/00 (2010.01); H01L 33/04 (2010.01); H01L 33/10 (2010.01); H01L 33/12 (2010.01); H01L 33/32 (2010.01); H01L 33/36 (2010.01); H01L 33/62 (2010.01);
U.S. Cl.
CPC ...
H01L 33/06 (2013.01); H01L 33/0025 (2013.01); H01L 33/12 (2013.01); H01L 33/32 (2013.01); H01L 33/36 (2013.01); H01L 33/62 (2013.01); H01L 33/04 (2013.01); H01L 33/10 (2013.01);
Abstract

A semiconductor heterostructure for an optoelectronic device with improved light emission is disclosed. The heterostructure can include a first semiconductor layer having a first index of refraction n1. A second semiconductor layer can be located over the first semiconductor layer. The second semiconductor layer can include a laminate of semiconductor sublayers having an effective index of refraction n2. A third semiconductor layer having a third index of refraction n3 can be located over the second semiconductor layer. The first index of refraction n1 is greater than the second index of refraction n2, which is greater than the third index of refraction n3.


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