The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2024

Filed:

Nov. 12, 2021
Applicant:

Innoscience (Suzhou) Technology Co., Ltd., Suzhou, CN;

Inventors:

Qingyuan He, Suzhou, CN;

Ronghui Hao, Suzhou, CN;

Fu Chen, Suzhou, CN;

Jinhan Zhang, Suzhou, CN;

King Yuen Wong, Suzhou, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/085 (2006.01); H01L 21/8252 (2006.01); H01L 23/522 (2006.01);
U.S. Cl.
CPC ...
H01L 27/085 (2013.01); H01L 21/8252 (2013.01); H01L 23/5221 (2013.01);
Abstract

A nitride-based semiconductor device includes a first nitride-based semiconductor layer, a second nitride-based semiconductor layer, a first nitride-based transistor, and a second nitride-based transistor. The first nitride-based transistor applies the 2DEG region as a channel thereof and comprising a first drain electrode that makes contact with the second nitride-based semiconductor layer to form a first Schottky diode with the second nitride-based semiconductor layer. The second nitride-based transistor applies the 2DEG region as a channel thereof and includes a second drain electrode that makes contact with the second nitride-based semiconductor layer to form a second Schottky diode with the second nitride-based semiconductor layer, such that the first Schottky diode and the second Schottky diode are connected to the same node.


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