The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2024
Filed:
Jul. 26, 2023
Applicant:
Micromass Uk Limited, Wilmslow, GB;
Inventors:
Anatoly Verenchikov, Bar, ME;
Mikhail Yavor, St. Petersburg, RU;
Assignee:
Micromass UK Limited, Wilmslow, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/40 (2006.01);
U.S. Cl.
CPC ...
H01J 49/406 (2013.01); H01J 49/405 (2013.01);
Abstract
Improved ion mirrors(FIG.) are proposed for multi-reflecting TOF MS and electrostatic traps. Minor and controlled variation by means of arranging a localized wedge field structureat the ion retarding region was found to produce major tilt of ion packets time fronts. Combining wedge reflecting fields with compensated deflectors is proposed for electrically controlled compensation of local and global misalignments, for improved ion injection and for reversing ion motion in the drift direction. Fine ion optical properties of methods and embodiments are verified in ion optical simulations.