The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2024
Filed:
Mar. 31, 2022
Samsung Electronics Co., Ltd., Suwon-si, KR;
Youngdo Kim, Hwaseong-si, KR;
Sungyong Lim, Seoul, KR;
Daewon Kang, Seoul, KR;
Sungyeol Kim, Yongin-si, KR;
Sangki Nam, Seongnam-si, KR;
Myunggeun Song, Seoul, KR;
Byungkook Cho, Seongnam-si, KR;
Hyeoncheol Jin, Hwaseong-si, KR;
Jonghun Pi, Gyeongsangbuk-Do, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A semiconductor processing system includes: a semiconductor processing chamber including an electrostatic chuck disposed in a chamber housing, and a first power supplier for supplying first radio frequency (RF) power to an internal electrode disposed in the electrostatic chuck; a voltage measuring device for measuring a voltage corresponding to the first RF power to output a digital signal; and a control device for outputting an interlock control signal to the semiconductor processing chamber, when it is determined that the voltage increases to be within a predetermined reference range based on the digital signal. The electrostatic chuck is configured to enable a wafer to be seated on a surface of the electrostatic chuck.