The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2024

Filed:

May. 11, 2020
Applicant:

Advanced Energy Industries, Inc., Fort Collins, CO (US);

Inventor:

Daniel Carter, Fort Collins, CO (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H03K 3/64 (2006.01); H03K 3/70 (2006.01); H03K 3/78 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32137 (2013.01); H01J 37/32715 (2013.01); H03K 3/64 (2013.01); H03K 3/70 (2013.01); H03K 3/78 (2013.01); H01J 37/32183 (2013.01); H01J 2237/004 (2013.01); H01J 2237/334 (2013.01);
Abstract

Systems, methods and apparatus for regulating ion energies in a plasma chamber and avoiding excessive and damaging charge buildup on the substrate surface and within capacitive structures being built on the surface. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis, and to maintain surface charge buildup below a threshold.


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