The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2024

Filed:

Sep. 10, 2019
Applicant:

Fluidigm Canada Inc., Markham, CA;

Inventors:

Daaf Sandkuijl, Markham, CA;

Alexander V. Loboda, Thornhill, CA;

Adam Carew, Toronto, CA;

Khashayar Askarpour, Markham, CA;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 21/24 (2006.01); G01N 1/04 (2006.01); G01N 33/543 (2006.01); G02B 21/00 (2006.01); G02B 21/26 (2006.01); H01J 49/00 (2006.01); H01J 49/10 (2006.01);
U.S. Cl.
CPC ...
G02B 21/245 (2013.01); G01N 1/04 (2013.01); G01N 33/543 (2013.01); G02B 21/0032 (2013.01); G02B 21/006 (2013.01); G02B 21/26 (2013.01); H01J 49/0004 (2013.01); H01J 49/0031 (2013.01); H01J 49/105 (2013.01); G01N 2001/045 (2013.01); G01N 2458/15 (2013.01);
Abstract

We describe in this application systems and methods for autofocusing in imaging mass spectrometry. The present application describes improvements over current IMS and IMC apparatus and methods through an autofocus component including a plurality of apertures in the autofocus system, such as a plurality of apertures arranged in 2 dimensions. As a plurality of apertures is used, the autofocus system provides redundancy in the event that measurement of focus on the sample from the illuminating radiation passed through one or more of the apertures fails so as to reduce the number of unsuccessful autofocus attempts.


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